Hannah Frieser from Light Works will be this years juror.
Only photographers from certain counties in New York State are eligible.
From the website:
The 2009 Photographers’ Fellowship Fund deadline is Wednesday September 30th, 2009 (postmarked).
NEW FOR 2009 One $2,500 fellowship will be granted to a regional artist selected by a guest juror.
There is no fee to enter, and if selected, your award may be used in any way you choose to help advance your creative career. Fellowship recipients are only required to contribute a piece to CPW’s Permanent Print Collection, which is held on extended loan at the Samuel Dorsky Museum of Art at SUNY New Paltz.
The 2009 Photographers Fellowship Fund Award will be presented at CPW’s Annual Benefit Gala held in Woodstock on Sunday October 11.
Who is eligible?
If you reside in one of the following New York State counties: Albany, Clinton, Columbia, Delaware, Dutchess, Essex, Franklin, Fulton, Greene, Hamilton, Montgomery, Orange, Otsego, Putnam, Rensselaer, Saratoga, Schenectady, Schoharie, Sullivan, Ulster, Warren, and Washington. Proof of residency is required.
CPW Board members, staff, or residents who will be students in the fall of 2009 may not apply. Previous recipients may apply again after five years.
What do you need to submit?
To enter, please submit:
a portfolio of ten prints*
a image list detailing titles, medium, year.
an artist statement and bio.
We cannot accept submissions via email.
*Print Portfolios are strongly encouraged over slide or digital file submissions. Please do not submit print portfolios larger than 20×30” if your work is larger than 20×30 please submit a smaller portfolio along with one sample print and the intended exhibition/display size.
Entries may also be submitted in slide or digital file format. For digital files please submit JPEGS at 300 dpi, 4×5″ formatted on a CD-ROM. All work samples must be labeled with your name, phone #, image title, date, size, and media. For CD-ROM submissions, please include an image script identifying the listed information.